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| № |
Patent number |
Title of the invention and abstract piece | Date of publication of the patent |
|---|---|---|---|
| 1 | TWI316634B |
ACTIVE MATRIX TYPE LIQUID CRYSTAL DISPLAY DEVICE
Power consumption in an active matrix type liquid crystal display device having partial display function is reduced. In one frame period, a display area corresponding to first 80 horizontal periods, that is the first line through the 80th line, is set as a partial display area and a display area corresponding to the remaining 239 lines is set as a background display area. And a partial display are... |
01.11.2009 |
| 2 | TWI316635B |
DISPLAY APPARATUS
A dielectric liquid layer is sandwiched between a pixel substrate and a counter substrate, at least one of which is a transparent. The dielectric liquid layer is made from a liquid that is macroscopically isotropic and transparent, but has clusters microscopically, the clusters being agglomerations in each of which liquid crystal molecules are aligned in short distance order. Because of the presen... |
01.11.2009 |
| 3 | TWI316636B |
SOLID-STATE IMAGE PICK-UP DEVICE
A method of manufacturing a solid state image pickup device including photoelectric conversion elements which are two-dimensionally arranged in a semiconductor substrate, and a color filter having a plurality of color filter patterns differing in color from each other and disposed on a surface of the semiconductor substrate according to the photoelectric conversion elements. The method including t... |
01.11.2009 |
| 4 | TWI316637B |
PROJECTION APPARATUS
A projection apparatus including an illumination system, a light valve, a first optical element, a first projection lens, and a second projection lens is provided. The illumination system is suitable to provide an illumination beam, and the light valve is disposed on a transmission path of the illumination beam. The light valve is suitable to convert the illumination beam into an image beam. The f... |
01.11.2009 |
| 5 | TWI316638B |
PROJECTION APPARATUS AND LAMP THEREOF
A projection apparatus including a lamp, a light valve and a projection lens is provided. The light valve is disposed on a transmission path of an illumination beam from the lamp for converting the illumination beam into an image beam, and the projection lens is disposed on a transmission path of the image beam. The lamp includes a lampshade, a filament, a first connector, a second connector, a le... |
01.11.2009 |
| 6 | TWI316639B |
LIGHT SOURCE UNIT AND PROJECTOR SYSTEM
A light source unit includes a light source made up of a reflector having a lamp accommodating opening and a light exiting opening, and a lamp having a bulb for emitting light and electrode introducing portions which guide electrodes into the bulb. In addition, the light source unit includes an anomalous lens which is disposed to collect light emitted from the light source to be situated on an opt... |
01.11.2009 |
| 7 | TWI316640B |
PROJECTION APPARATUS
A projection apparatus includes a projection module and a user operation interface including a button module and a sensor module. The button module includes a button and a light source located under the button. The sensor module is electrically connected to the button module and the sensor module has a sensing scope. The sensing scope covers a location above the button module. When hands of user a... |
01.11.2009 |
| 8 | TWI316641B |
No name
Disclosed is a semi-automatic zooming method for a manually-zooming optical component and a videotaping device using such method, particularly to semi-automatic zooming method for a manually-zooming a telescopic lens having videotaping features and a distant-zooming videotaping device using such method. Upon rotating the telescopic lens to perform manual adjustment, the system is able to determine... |
01.11.2009 |
| 9 | TWI316642B |
IMAGE ALIGNING METHOD
An image aligning method includes: fetching at least two images; calculating a relative displacement between those adjacent images by utilizing a phase correlation algorithm; calculating an absolute displacement between any one of those images and the first image of those images; and computing a common area of those images by utilizing the relative displacement and the absolute displacement, and d... |
01.11.2009 |
| 10 | TWI316643B |
CAMERA SYSTEMS AND METHODS WITH VIBRATION COMPENSATION
Camera systems and methods with vibration compensation. The system comprises a first sensor, a second sensor, and a processing module. The first sensor detects an angle variation of a movement of a camera device to generate first sensed data. The second sensor detects a position movement of an image sensor of the camera device to generate second sensed data. The processing module takes the first d... |
01.11.2009 |
| 11 | TWI316644B |
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM CONTAINING THE SAME
A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or more of (meth)acryloyl groups per molecule whose acid value of less than 10 mg KOH/g, an alkali soluble polymer compound, a photopoly... |
01.11.2009 |
| 12 | TWI316645B |
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
A positive resist composition that includes a resin component (A), which contains acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer (A1) containing a first structural unit (a1) derived from hydroxystyrene and a second s... |
01.11.2009 |
| 13 | TWI316646B |
A METHOD FOR ETCHING AND FOR FORMING A CONTACT HOLE USING THEREOF
A method for forming a structure formed by etching which is typified by a contact hole in the semiconductor and a method for manufacturing a display device using the structure. The etching method includes at least, forming an organic mask having a first opening portion and a second opening portion by patterning an organic film which includes either one of an organic film and a film with the additi... |
01.11.2009 |
| 14 | TWI316647B |
METHOD OF MAKING A PRINTING SLEEVE
The photosensitive printing element of the invention comprises a hollow cylindrical support layer ( 2 ), at least one layer of photopolymerizable material ( 3 ), and a masking layer ( 4 ). Portions of the masking layer are removed by laser radiation. The layer of photopolymerizable material ( 3 ) is then exposed to actinic radiation through the hollow cylindrical support layer ( 2 ) to create a fl... |
01.11.2009 |
| 15 | TWI316648B |
BUFFER PACKING APPARATUS | 01.11.2009 |
| 16 | TWI316649B |
No name
The invention provides a projection exposure device that makes precise positional alignment possible. With a printed circuit board 76 placed on a mobile stage 70, a mask mark 90 is irradiated by an ultra-violet light source 60 of an ultra-violet illumination device 6, thereby the image of the mask mark 90 is passed through a projection exposure lens 71 and a half-mirror 11, then reflected by an u... |
01.11.2009 |
| 17 | TWI316650B |
ALKALI CLEANING AGENT
An alkali cleaner is described, including an alkali component (A), a polyvalent alcohol (B) of 3 to 8 valent containing no nitrogen atom and having a Mn of 92-400, and an alcohol (C). The alcohol (C) includes at least one alcohol selected from the group consisting of a divalent alcohol (C1) containing no nitrogen atom and having a Mn of 62-250 and a monovalent alcohol (C2) containing no nitrogen a... |
01.11.2009 |
| 18 | TWI316651B |
WIRE-SAVING OPTICAL ENCODER HAVING SERVOMOTOR IDENTIFICATION INFORMATION AND FEEDBACK MESSAGING METHOD FOR THE SAME | 01.11.2009 |
| 19 | TWI316652B |
No name | 01.11.2009 |
| 20 | TWI316653B |
WAFER-BASED PLANNING METHODS AND SYSTEMS FOR BATCH-BASED PROCESSING TOOLS
Computer-implemented wafer-based planning methods for batch-based processing tools. Tool groups are appended in a tool group level of planning data provided by a MES for converting planning data from batch-based to wafer-based data. The planning data with appended tool group is applied to dispatch processing tools. |
01.11.2009 |