An alignment mark determines alignment of a first and a second exposure on a substrate on a macro level and a micro level. The alignment mark includes a first alignment pattern projected during the first exposure and a second alignment pattern projected during the second exposure. The alignment mark includes a first sub-mark at least partially defined by the first alignment pattern and a second su...

A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation b...

A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.

A data processing system (100) comprises: a database (4); a host computer (3) and a user computer (1) capable of communicating with each other over a network (2); wherein the user computer sends a data request message (RQ) to the host computer (3), the request message containing Data information (RD), Identity information (RI), and Authenticity information (A; VI), wherein the host computer (3) ch...

Haymaking device (1), having at least a first (12A) and a second (12B) crop displacing tool, arranged side to side, and first (16A) and second (16B) transfer means for transferring the crop processing tools (12A,B) from an operative position, to a standby position, and vice versa, respectively, a programmable control unit (20) for the transfer means, wherein the transfer means (16A,B) are capable ...