Methods for manufacturing semiconductor devices simultaneously to implement low-voltage and high-voltage devices in a single chip. In one example embodiment, a method includes various acts. An isolation layer is formed on a wafer. A gate oxide layer and a lower gate poly are sequentially formed on a first low-voltage transistor region. A first poly oxide layer is formed. A nitride layer is formed ...

An apparatus for fabricating semiconductor devices is provided to decrease the apparatus abrasion by separately managing the isolation part and engaging part of equipment. The power is generated from the power transmission. The power is delivered to the valve head part through a torque prevention unit. A joint hole(601) is the hole for connecting a power bar(606). A limit line(602) shows the final...

An apparatus for preventing transformation of a critical dimension of an oven unit is provided to prevent transformation of a critical dimension due to a delay by reducing the delay in the oven unit. An oven unit(100) includes a hot plate and an oven cover. A timer(110) is formed in one side of the oven unit, and checks a delay time of a wafer. A main controller(120) confirms and controls the dela...

An apparatus for exhausting a chamber gas is provided to prevent permeation of a residual gas inside a chamber in a different process block by completely removing the residual gas after a chamber cover is raised up according to a process completion. A wafer is loaded on a plate(110). A first round vent(120) exhausts a residual gas inside a chamber. A second round vent(130) exhausts the residual ga...

A method of manufacturing a MOSFET is provided to reduce the area of drain by using a deep trench structure and to prevent the degradation and the electrical characteristic of the punch-through between source and drain. The NBL(N Buried Layer)(202) is formed on a semiconductor substrate(201). A plurality of field oxide films(207,210) is formed on the semiconductor substrate having NBL. The N+ regi...

A semiconductor device is provided to increase a channel dimension and to reduce on-resistance by forming channels not only in an interface between a protrusion electrode and a source/diffusion region but also in an interface between a gate electrode and the source/diffusion region. An epitaxial layer(600) is formed on a substrate. A gate electrode(100a) is filled inside a trench formed on the epi...

PURPOSE: A phase shift mask and a manufacturing method thereof are provided to prevent a side lobe between the common source contact hole and the drain contact hole using a shield pattern. CONSTITUTION: A phase shift mask comprises a reticle substrate, a first aperture pattern, second aperture patterns(320-1,320-2,330-1,330-2), and a mask(300). The first aperture pattern is formed in a first area ...

PURPOSE: A transplant position guide pin is provided, which prevents the bone of a testing animal from being broken using a thin guide pin. CONSTITUTION: A transplant position guide pin comprises a body(11) of a pin configuration which gets close to a transplanted implant and is inserted into the bone; a transplant position display unit(13a) which is exposed to the outside of the bone from one-sid...

PURPOSE: A BLU(Backlight Unit) equipped with a support bar is provided to prevent an inferior material in which the central part of the liquid crystal panel caves in to the rear end by supporting a rear side of the rear side of the liquid crystal panel. CONSTITUTION: A lower chassis(200) comprises an illuminating unit(202). A supporting bar is installed across a sidewall(208) of the bottom chassis...

The present invention relates to a structure of a natural or artificial hair for a hair transplant and, more particularly, to a processed structure of a natural or artificial hair for transplantation, comprising: a number of fixing cut parts formed lengthwise on the outer circumferential surface line of a lower end part of a natural or artificial hair to be transplanted to a scalp of a person, tha...

The present invention relates to a system and method of planning and managing real-time postal delivery work that formulates a delivery plan according to a delivery workload in real time, provides information about the delivery plan, and provides and manages information about collection work of returned and confirmed mail items.

Disclosed are a row-vector norm comparison method and a row-vector norm comparison apparatus for an inverse matrix. A row-vector norm comparison apparatus includes: an input matrix processing module that receives and combines constituent elements of a matrix; a cofactor operation module that multiplexes the combination result of the constituent elements to calculate factors constituting an adjoint...

An address controlling method for hand-off on heterogenous networks is provided to reduce packet loss and delay by handoff by supporting fast handoff between other heterogenous networks. A terminal receives a message including the information of a first AR(Access Router) connecting through the hand-off. The information of one prefix selected by first AR prefixes is transmitted to the terminal(S310...

An adaptive beam-forming apparatus and a method thereof are provided to improve the reception performance of a DMB(Digital Multimedia Broadcasting) system. Plural radio frequency tuners receive the same DMG signal every frame(S100), and an adaptive beam-forming unit estimates the starting location of a phase reference signal(S200). The adaptive beam-forming unit sets up a weight for forming a beam...

The present invention relates to a method of calculating a log-likelihood ratio and a method of detecting a transmission signal. According to the present invention, when a transmission symbol candidate vector is detected on the basis of a received signal, a threshold value and an ML metric of each transmission symbol candidate vector are calculated and the ML metric that is larger than the thresho...

A high radiation heat sink coated with inorganic materials, a manufacturing method thereof, and a metal PCB equipped with the same are provided to apply to a heated part of a CPU, a chipset, and a TV set by reducing space and weight remarkably, and realizing high heat sink and discharging effect. A heat sink is made by coating inorganic coating agent to both sides of a metallic member(11) of 0.5-5...