The present invention relates to a wrapper (1) for wrapping bales, in particular round bales (100) of crop material, comprising a frame (2), a wrapping table (5) to support the bale during wrapping, a wrapping device (6) to wrap wrapping material about the bale, wherein the wrapper comprises at least two lateral guiding elements arranged to enclose a bale supported on the wrapping table to limit l...

The invention relates to a wrapper (1) for wrapping round bales (100) of crop material, comprising: - a frame (2), - a wrapping table (5) pivotable between a wrapping position and a bale release position, - a wrapping device (6), and - an unloading device (8), comprising an unloading arm (9) movable between a receiving position and a release position, and a ground support (10) movable between a li...

The invention relates to a wrapper (1) for wrapping bales of crop material, comprising a frame (2), a wrapping table (5), a wrapping device (6), and a loading device (8), wherein the loading device comprises a pivotable loading structure (9), and at least one actuator (10) to move the loading structure between a pick-up position and a release position, wherein the loading structure comprises two l...

A stress-decoupling device and methods of using same in a cooled grazing-incidence collector (GIC) mirror system are disclosed. A method includes providing a cooled GIC shell, providing input and output primary cooling-fluid manifolds, and fluidly connecting the cooled GIC shell to the input and output primary cooling-fluid manifolds through respective stress-decoupling devices. An exemplary stres...

The present invention is related to a device and method for testing a body supporting object (11,12) by exposure to a load (1). According to the invention the device comprises a buffer in which at least one body supporting object of first type (11) can be placed, a transport device (9, 10) for selecting a body supporting object (11, 12) from the buffer, and placement means (9,10) for placing that ...

The present invention relates to a buffering device (2) and method for buffering products (P) such as apples. The device according to the invention comprises: - a liquid basin (22); - a supply means (18, 28, 38) wherein during use an entry side is operatively connected to a feed channel (18) and an exit side of the supply means (18, 28, 38) is provided below the liquid level in the basin (22), suc...

A lithographic apparatus includes an optical column configured to create a pattern on a target portion of a substrate, the optical column including a controllable element (906) configured to provide a beam; and a projection system configured to project the beam onto the target portion; an actuator (936) configured to move at least a part (924, 940) of the optical column with respect to the substra...

A lithographic apparatus including an optical column configured to project a beam on a target portion of a substrate is disclosed. A focus controller is provided to control the focus position (906, 920, 924, 930) of the optical column with respect to a reference object, wherein the focus controller comprises a focus measurement device (942) configured to determine a focus quality on the reference ...

The invention relates to a lithographic apparatus with a substrate table constructed to hold a substrate and an optical column 924, 930) capable of creating a pattern on a target portion of the substrate. The apparatus has an actuator (928) to move the optical column or part thereof with respect to the substrate. The movement of the optical column or part thereof through a medium causes a heat loa...

The invention relates to a lithographic apparatus comprising one or more optical columns capable of projecting a beam on a target portion on a substrate held by the substrate support. The one or more optical columns may comprise one or more self-emissive contrast devices to emit the beam. The optical column may comprise a projection system to project the beam onto the target portion. The target po...

The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate. The optical column may be provided with a self emissive contrast device configured to emit beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a ...

The invention relates to a lithographic apparatus comprising a substrate table (902) constructed to hold a substrate (928) and an optical column capable of creating a pattern on a target portion of the substrate. The optical column may comprise a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams ...

A lithographic apparatus including an optical column configured to project a beam on a target portion of a substrate, the optical column including a radiation source configured to emit the beam; and, a projection system configured to project the beam onto the target portion; an actuator configured to move the optical column or a part thereof with respect to the substrate; a radiation source driver...

A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and a projection system (920, 924, 930) to project the beam onto the target portion; a scanning movement actuator configured to move the substrate with a scanning spe...

A lithographic apparatus includes an optical column capable of creating a pattern on a target portion of a substrate. The optical column has a programmable patterning device configured to provide a plurality of radiation beams and a projection system configured to project the plurality of beams onto the substrate. The apparatus may have an actuator to move the optical column, or a part thereof, wi...